1～10 item / All 10 items
Ideal for organic EL substrate cleaning! Alkaline-compatible spin cleaning device.
This device manually sets the workpiece onto the main body, performs vacuum suction, and conducts two-liquid cleaning, ultrasonic cleaning, and N2 blow drying while spinning.
This is a wafer chemical cleaning device of the manual type for 3D implementation!
The processing capacity is suitable for small quantities of 1-3 sheets, making it ideal for research and experimental purposes. There are no installation constraints with a 100V power supply. Its compact size allows for installation in just 1 square meter, making it economical. The pure water rinse uses a cascade system to minimize pure water consumption, resulting in low costs. The chemical temperature can be controlled. The rinse effect is assessed using a resistivity meter. The wafer cassette is designed with an incline to prevent liquid residue on the wafer surface. Space has been secured for the future addition of a second tank (including the lower tank). It comes with an air gun. The chemical tank can be easily cleaned with a shower nozzle.
A device that separates wafers one by one using a water jet within a chamber.
The "Wafer Separation Cleaning Device ME-5700" is a device that manually sets wafers onto a transport arm, where they are separated one by one using a water jet in the chamber, and then manually collected. The external dimensions are L1300×W1200×H2100. For more details, please contact us or refer to the catalog.
It is ideal for manufacturing equipment for substrates such as organic EL!
This is a device that performs the process of sending substrates through a series of steps, including cleaning brushes, HPMJ, MS, final rinsing, and water draining, to the discharge section using a sheet-by-sheet method.
Make effective use of limited space! It is a tabletop automatic spin cleaning machine.
This device is a tabletop automatic spin cleaner that manually sets the target workpiece and performs ultrasonic cleaning, pure water rinsing, and air blow drying through spin rotation.
It is a cleaning device for glass used in LCDs, organic ELs, solar cells, etc.!
This device is a cleaning machine for glass used in LCDs, organic ELs, solar cells, etc. It receives glass supply from the upstream process to the entrance conveyor, and cleans the glass using an entrance conveyor, shower, roll brush, two-fluid, and pure water rinse (with megasonic as an option), followed by water removal and drying. After static electricity removal, the cleaned glass is sent to the exit conveyor in a sheet-fed manner.
This is a device that performs brush cleaning, ultrasonic cleaning, rinse cleaning, and N2 blow drying processes!
This is a space-saving, double-sided washable mechanism for a sheet-type spin cleaning device. It is easy to maintain and features high-speed spin drying and N2 drying, which reduces water marks. (Patent No. 3558543)
A cleaning machine designed for the regeneration and cleaning of SUS-made filters. It removes dirt through internal and external pressure, allowing the filters to be reused as regenerated filters.
It features a compact and cost-effective design. Cleaning nozzles are installed on both the inside and outside to completely remove dirt. The workpiece is set on the work table, which rotates and is pressure washed from the inside. The water drainage of the filter is achieved by blowing high-pressure air from the cleaning nozzles through the switching of the solenoid valve. An ultrasonic cleaning tank is also available as an option.
Full automatic spin cleaning device for 300mm/8-inch wafers, glass.
This device manually sets a wafer cassette into the main body, sends the stored target work to the spin cleaning section using a robot, and performs two-fluid cleaning, ultrasonic cleaning, and N2 blow drying while spinning, before storing it back in the wafer cassette.
The brush is cleaned with detergent (surfactants, etc.) by spinning rotation.
The "Compact Spin Cleaning Device ME-510" is a manual spinner that allows the operator to set the target workpiece manually. It performs brush cleaning with detergent (such as surfactants) through spin rotation, followed by pure water rinsing and air blow drying. The maximum rotation speed is 3000 rpm, and it accommodates sample sizes ranging from 30 to 150 mm, including PET film and glass. The brush section features brush elevation, rotation, and detergent supply, while the pure water supply section operates with a rotary air cylinder for pure water delivery. The main body dimensions are W650 x D800 x H710, and it has an aluminum frame. For more details, please contact us or refer to the catalog.
